JJAP ONLINE : Table of Contents

Jpn. J. Appl. Phys. Vol.29(1990)
Part 1, No. 11, 20 November 1990

2327-2331 : Preparation of High-Quality n-Type Poly-Si Films by the Solid Phase Crystallization (SPC) Method

Takao Matsuyama, Kenichiro Wakisaka, Masaaki Kameda, Makoto Tanaka, Tsugufumi Matsuoka, Shinya Tsuda, Shoichi Nakano, Yasuo Kishi and Yukinori Kuwano

2332-2341 : Liquid Phase Epitaxy of Miscible and Immiscible GaInPAs Alloys on (100)-Oriented GaP_xAs_1-x (x=0, 0.2, 0.4) Substrates

Masayuki Ishikawa, Tomohiro Onda, Nagaatsu Ogasawara and Ryoichi Ito

2342-2350 : Incorporation of Arsenic and Gallium in InP Layers in GaInAs/InP Heterostructures Grown by MOVPE

Morio Wada, Masahito Seko, Katsutoshi Sakakibara and Yoichi Sekiguchi

2351-2357 : Analysis of Deposition Selectivity in Selective Epitaxy of GaAs by Metalorganic Chemical Vapor Deposition

Ko-ichi Yamaguchi and Kotaro Okamoto

2358-2364 : Optimization of Chemical Vapor Deposition Conditions of Amorphous-Silicon Films for Thin-Film Transistor Application

Hiroshi Kanoh, Osamu Sugiura, Paul A. Breddels and Masakiyo Matsumura

2365-2370 : Influence of Chamber Pressure on Hydrogen Bonding Configurations in a-SiGe:H Films Prepared by Photo-CVD

Abhijit De, Gautam Ganguly, Swati Ray and A. K. Barua

2371-2375 : Effect of Employing Positions of Thermal Cyclic Annealing and Strained-Layer Superlattice on Defect Reduction in GaAs-on-Si

Norio Hayafuji, Motoharu Miyashita, Takashi Nishimura, Kaoru Kadoiwa, Hisao Kumabe and Toshio Murotani

2376-2380 : Negative Transconductance in AlGaAs/GaAs Heterojunction Bipolar Transistors

Tetsuro Nozu and Masao Obara

2381-2385 : Influence of Effective Masses on the Oscillation of Fowler-Nordheim Tunneling in Thin SiO₂ MOS Capacitors

Yukinori Ono and Takahiro Makino

2386-2387 : Doping Characteristics of Gas-Source MBE-Grown n-Al_xGa_1-xAs (x=0-0.28) Doped Using Disilane(Short Note)

Toshio Fujii, Adarsh Sandhu, Hideyasu Ando, Yuji Kataoka and Hideaki Ishikawa

2388-2402 : New Classification Method for Layered Copper Oxide Compounds and Its Application to Design of New High T_c Superconductors

Yoshinori Tokura and Takahisa Arima

2403-2406 : Magnetic Shielding Effect of Ba₂YCu₃O_7-δ Plates

Shigetoshi Ohshima and Katsuro Okuyama

2407-2410 : Microwave Properties of Inhomogeneous YBa₂Cu₃O₇

Jun Tateno and Norio Masaki

2411-2412 : Flux Line Dynamics Crossover in the Tl-Ba-Ca-Cu-O Thin Film(Short Note)

Chungyung Wang, Hung-Lun Chang, Ming-Lee Chu, Jenh-Yih Juang, Yih-Shun Gou and Tzeng-Ming Uen

2413-2414 : Growth and Characterization of Bi₂(Sr_1-xCa_x)₃Cu₂O_y Single Crystals Extracted from KBr Flux(Short Note)

Toetsu Shishido, Naoki Toyota, Daisuke Shindo and Tsuguo Fukuda

2415-2416 : Polarized Electromagnetic Detections by High T_c Superconducting Antenna(Short Note)

Toshiro Ohnuma

2417-2419 : Local Magnetic Anisotropic Effects in Fe-B-Si Metallic Glasses

G. V. S. Murthy and S. B. Raju

2420-2423 : Crossed Grating Beam Splitter for Magnetooptical Pickup Head

Nobuhiro Kawatsuki and Masao Uetsuki

2424-2425 : Resonance Phenomenon in a Self-Terminating Metal Vapor Laser(Short Note)

Hiroshi Taniguchi and Hiroshi Saito

2426-2428 : Chlorine-Kβ X-Ray Emission Spectra from 3d Transition-Metal Chlorides

Chikara Sugiura

2429-2434 : Crystal Growth during the Sintering of Ultrafine SiC Powders Containing Much Free-Si

Yoshinori Ando and Masato Ohkohchi

2435-2439 : Effect of La Content on the Thermal Volume Change of Ba_4.22Na_1.44Nb_10.12O_30.24-Ba₃NaLaNb₁₀O₃₀ Solid Solutions at Ferroelectric Transition Temperature

Masaji Shimazu, Hirokazu Shinya, Shinichiro Kuroiwa, Masayuki Tsukioka and Sadao Tsutsumi

2440-2444 : Effect of Hydrogen on Pseudomorphic ZnSe onto GaAs by the Alternate Gas Supply of Dimethylzinc and Dimethylselenide in the MOMBE System

Yoichi Kawakami, Takashi Toyoda, Yi-hong Wu, Shizuo Fujita and Shigeo Fujita

2445-2449 : Gas Evaporation of Zn by Means of the Top-Heating Vertical Furnace

Minoru Dohi, Shinya Sawai, Manabu Kato and Nobuhiko Wada

2450-2455 : Role of Silicon Self-Interstitials Injected by Thermal Oxidation in Oxygen Precipitation in Czochralski Silicon

Hideki Yamanaka, Yoshihira Aoki and Takahide Samizo

2456-2459 : Anomalous Change in Temperature during the Pressure-Induced Phase Transition of KI

Motoyuki Nomura, Hideo Harino and Tsukasa Itoh

2460-2464 : Decomposition Temperature of Fatty Acid Metal Salts Used as the Constituent Molecules of Molecular Cognizance Thin Solid Films

Toshiaki Ushikusa

2465-2466 : Rapid Cooling Process in Thermooptic Effect of Smectic A-Cholesteric Mixed Liquid Crystals(Short Note)

Nobuhiko Nawa

2467-2472 : Preparation of BaTiO₃ and SrTiO₃ Polycrystalline Thin Films on Flexible Polymer Film Substrate by Hydrothermal Method

Nobuo Ishizawa, Hidekuni Banno, Motoo Hayashi, Seung Eul Yoo and Masahiro Yoshimura

2473-2476 : AES and XPS Studies of Surface of Al_xGa_1-xAs (110) Treated by Ammonium Sulfide

Hirotaka Ohno, Hidenori Kawanishi, Yoshiro Akagi, Yoshiharu Nakajima and Toshiki Hijikata

2477-2480 : Nitride and Oxide Formation on Pure Metals by Pulse Laser Irradiation

Shigeto R. Nishitani, Hiroto Yamaoka and Masaharu Yamaguchi

2481-2486 : Quantum Size Effect and HRTEM Observation of CdSe Microcrystallites Doped into SiO₂-Glass Films Prepared by Rf-Sputtering

Keiji Tsunetomo, Akira Kawabuchi, Haruyuki Kitayama, Yukio Osaka and Hiroyuki Nasu

2487-2490 : ECR Plasma CVD Using a Slotted Lisitano Coil

Yoshinobu Kawai, Akio Komori, Hidehiko Ikeda, Kengo Kishimoto, Masayoshi Murata and Satoshi Uchida

2491-2496 : Local Structure of ECR Process Plasma

Shoji Miyake, Wei Chen and Tomio Ariyasu

2497-2498 : Time-Averaged Electric Field Profiles in a Capacitive Coupling Parallel Plate Electrode RF Discharge Helium Plasma(Short Note)

Teruo Kaneda, Tadahiro Kubota, Mikio Ohuchi and Jen-Shih Chang

2499-2500 : Observation of a Visible Line Emission from RF and ECR Oxygen Plasmas(Short Note)

Yuichi Sakamoto, Hideki Kokai, Shuji Komuro, Tomoo Uchiyama, Kunihiro Kashiwagi, Takitaro Morikawa and Yoichi Murayama

2501-2505 : Fractal Structure of Electrochemically Polymerized Polypyrrole and Growth Process as Function of Monomer Concentration, Electrolyte Concentration and Applied Voltage

Masaharu Fujii, Yasuhide Saeki, Kiyomitsu Arii and Katsumi Yoshino

2506-2511 : Molecular Interaction between Merocyanine Dye and Several Kinds of Triphenyl Methane Derivatives in Langmuir-Blodgett Films

Choichiro Okazaki, Shigekazu Kuniyoshi, Kazuhiro Kudo and Kuniaki Tanaka

2512-2513 : The Comparison of the Background Removal Methods in XPS Spectra(Short Note)

Heizo Tokutaka, Naganori Ishihara, Katsumi Nishimori, Satoru Kishida and Takuei Takabuchi

2514-2518 : Thin Film Monitoring with Ellipsometry in In-Line Processing Equipment

Yasuaki Hayashi

2519-2525 : Precise Pressure-Temperature Control System for Electrical Measurements down to 4.2 K Using Helium Gas as a Pressure Transmitting Medium

Tomoyuki Hikita, Taketoki Maruyama and Noboru Yamada

2526-2530 : Plasma CVD-Grown ¹⁰B-Enriched Boron Films for Si Neutron Detectors

Noritada Sato, Osamu Ishiwata, Yasukazu Seki and Atsushi Ueda

2531-2534 : Position Control of Electron Energy Loss Spectrum in Case of Accelerating-Voltage Fluctuation

Kiyokazu Yoshida, Akio Takaoka, Katsumi Ura and Hiroshi Fujita

2535-2540 : Si/W Ratio Changes and Film Peeling during Polycide Annealing

Chue-san Yoo, Tin-hwang Lin, Nun-sien Tsai and Leo. J. Ijzendoorn

2541-2542 : X-Ray Photoacoustic Spectroscopy of Brass(Short Note)

Taro Toyoda, Tsutomu Masujima, Hideaki Shiwaku, Atsuo Iida and Masami Ando

2543-2549 : Penetration of Hypervelocity Projectile into Foamed Polystyrene

Toshihiro Ishibashi, Akira Fujiwara and Naoyuki Fujii

2553-2558 : ArF Excimer Laser Projection Lithography Using Partially Achromatized Lens System

Yoshiharu Ozaki, Yoshio Kawai and Akira Yoshikawa

2559-2562 : Nanometer Pattern Transfer by VUV Lithography with a D₂ Lamp

Katsuhiko Mutoh, Takashi Iwabuchi, Kazuhiro Kudo, Hisashi Watanabe, Yoshihiro Todokoro, Takeo Miyata and Reiji Sano

2563-2567 : A Consideration of the Deformation of Rectangular Pattern

Hidehito Tanaka, Tsuneo Ota, Keisuke Tanimoto, Ryohei Kawabata and Hikou Shibayama

2568-2571 : A Chromatic Aberration-Free Heterodyne Alignment for Optical Lithography

Tatsuhiko Higashiki, Toru Tojo, Mitsuo Tabata, Takeshi Nishizaka, Mitsuo Matsumoto and Yoshito Sameda

2572-2576 : Study of Hydrogen Vacuum-Ultraviolet Light Sources for Submicron Lithography

Kazuhiro Kudo, Takashi Iwabuchi, Katsuhiko Mutoh, Takeo Miyata, Reiji Sano and Kuniaki Tanaka

2577-2583 : New Alignment Sensors for Optical Lithography

Nobutaka Magome, Kazuya Ota and Kenji Nishi

2584-2589 : Electron Beam Direct Writing Technologies for 0.3-µm ULSI Devices

Koichi Moriizumi, Susumu Takeuchi, Takeshi Fujino, Satoshi Aoyama, Masahiro Yoneda, Hiroaki Morimoto and Yaichiro Watakabe

2590-2595 : Electron Beam Direct Writing Technology for 64-Mb DRAM LSIs

Fumio Murai, Yoshinori Nakayama, Isao Sakama, Toru Kaga, Yoshinobu Nakagome, Yoshifumi Kawamoto and Sinji Okazaki

2596-2599 : The Application of the Correlation Method for the EB (Electron Beam) Exposure System

Ichiro Kawamura, Teruaki Okino, Nobuo Handa, Hitosi Sato and Nobuo Goto

2600-2604 : High-Precision X-Ray Mask Technology

Shigehisa Ohki and Hideo Yoshihara

2605-2609 : Silicon Membrane Mask Blanks for X-Ray and Ion Projection Lithography

B. Löchel, J. Chlebek, J. Grimm, H.-L. Huber and A. Macioek

2610-2615 : Dynamic Thermal Distortions in an X-ray Mask Membrane During Pulsed X-Ray Exposure

Akira Chiba and Koichi Okada

2616-2619 : Ta Film Properties for X-Ray Mask Absorbers

Masatoshi Oda, Akira Ozawa, Shigehisa Ohki and Hideo Yoshihara

2620-2624 : Update on the Compact Synchrotron X-Ray Source Helios

M. N. Wilson, A. I. C. Smith, V. C. Kempson, A. L. Purvis, R. J. Anderson, M. C. Townsend, A. R. Jorden, D. E. Andrews, V. P. Suller and M. W. Poole

2625-2631 : New Simulation for Wet and Dry Developable Photoresists

A. J. W. Tol, M. E. Reuhman, G. D. Maxwell, H. P. Urbach and R. J. Visser

2632-2637 : Negative Resist for i-Line Lithography Utilizing Acid Catalyzed Silanol-Condensation Reaction

Nobuaki Hayashi, Keiko Tadano, Toshihiko Tanaka, Hiroshi Shiraishi, Takumi Ueno and Takao Iwayanagi

2638-2640 : Organotin-Containing Resists (TMAR) for X-Ray Lithography

Youko Tanaka, Hideo Horibe, Shigeru Kubota, Hiroshi Koezuka, Nobuyuki Yoshioka, Satoshi Aoyama, Yaichiroh Watakabe and Hideki Maezawa

2641-2643 : High Etch Rate Modes in Microwave Plasma Etching of Silicon in High Magnetic Fields

Haruo Shindo, Tetsuro Hashimoto, Fumitake Amasaki and Yasuhiro Horiike

2644-2647 : Highly Selective AlSiCu Etching Using BBr₃ Mixed-Gas Plasma

Masahiro Yoneda, Hisaharu Sawai, Nobuo Fujiwara, Kyusaku Nishioka and Haruhiko Abe

2648-2652 : Atomic Layer Controlled Digital Etching of Silicon

Hiroyuki Sakaue, Seiji Iseda, Kazushi Asami, Jirou Yamamoto, Masataka Hirose and Yasuhiro Horiike

2653-2656 : Novel Process for Direct Delineation of Spin on Glass (SOG)

Akira Imai, Hiroshi Fukuda, Takumi Ueno and Shinji Okazaki

2657-2661 : Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with In-situ XPS Measurement

Hideaki Kawamoto, Hiroyuki Sakaue, Shinobu Takehiro and Yasuhiro Horiike

2662-2664 : Fundamental Characteristics of Capillary-Type Cluster Ion Source and Its Application for Selective Deposition of Aluminum Film

Mutsuo Ogura, Masanori Komuro and Keizo Shimizu

2665-2670 : SiO₂/Si Interfaces Studied by STM and HRTEM (II)

Masaaki Niwa, Minoru Onoda, Michikazu Matsumoto, Hiroshi Iwasaki and Robert Sinclair

2671-2674 : Electron-Beam Testing of Microwiring Substrates

Matthias Brunner, Ralf Schmid, Reinhold Schmitt, Burkhard Lischke, Mireille Wörner and Nikola Then Bergh

2675-2679 : Fabrication of Free-Standing Single-Crystal Silicon Nanostructures for the Study of Thermal Transport and Defect Scattering in Low Dimensional Systems

A. Potts, D. A. Williams, R. J. Young, R. J. Blaikie, R. A. McMahon, D. G. Hasko, J. R. A. Cleaver and H. Ahmed

2680-2683 : Microbeam Line of MeV Heavy Ions for Materials Modification and In-Situ Analysis

Yuji Horino, Akiyoshi Chayahara, Masato Kiuchi, Kanenaga Fujii, Mamoru Satoh and Mikio Takai

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Table of Contents

Jpn. J. Appl. Phys. Vol.29(1990) Part 1, No. 11, 20 November 1990

Jpn. J. Appl. Phys. Vol.29(1990)
Part 1, No. 11, 20 November 1990