Jpn. J. Appl. Phys. 35 (1996) pp. L126-L129 |Next Article| |Table of Contents|
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Fabrication of Gold Nanodot Array Using Anodic Porous Alumina as an Evaporation Mask
Hideki Masuda and
Masahiro Satoh
Department of Industrial Chemistry, Faculty of Engineering,
Tokyo Metropolitan University, 1-1 Minamiosawa, Hachioji, Tokyo 192-03, Japan
(Received August 9, 1995; accepted for publication November 27, 1995)
A highly ordered gold nanodot array was fabricated by vacuum evaporation using an anodic porous alumina membrane with through-holes of nanometer scale as a mask. This technique resulted in an orderly arrangement of Au dots with a diameter of approximately 40 nm over a large area on a Si substrate.
KEYWORDS:
nanofabrication, nanodot array, anodic porous alumina, evaporation mask, gold
URL:
http://jjap.ipap.jp/link?JJAP/35/L126/
DOI: 10.1143/JJAP.35.L126
- H. G. Craighead:
J. Appl. Phys. 55 (1984) 4430[AIP Scitation].
- H. Temkin, G. J. Dolan, M. B. Oanish and N. G. Chu:
Appl. Phys. Lett. 50 (1987) 413[AIP Scitation].
- H. G. Craighead and G. A. Niklasson:
Appl. Phys. Lett. 44 (1984) 1134[AIP Scitation].
- T. Hepel and J. Osteryoung: J. Electrochem. Soc. 133 (1986) 752.
- T. Sato, K. Hiruma, M. Shirai, K. Tominaga, K. Haraguchi, T. Katsuyama and T. Shimada:
Appl. Phys. Lett. 66 (1995) 159[AIP Scitation].
- C. B. Roxlo, H. W. Deckman and B. Abeles:
Phys. Rev. Lett. 57 (1986) 2462[APS].
- A. Wiedensohler, H.-C. Hansson, I. Maximov and L. Samuelson:
Appl. Phys. Lett. 61 (1992) 837[AIP Scitation].
- M. Green, M. Garcia-Parajo, F. Khaleque and R. Murray:
Appl. Phys. Lett. 62 (1993) 264[AIP Scitation].
- T. L. Morkved, P. Witzius, H. M. Jaeger, D. G. Grier and T. A. Witten:
Appl. Phys. Lett. 64 (1994) 422[AIP Scitation].
- J. M. Moison, F. Houzay, F. Barthe, L. Leprince, E. Andre and O. Vatel:
Appl. Phys. Lett. 64 (1994) 196[AIP Scitation].
- J. Ahopelto, V.-M. Airaksinen, E. Siren and H. E.-M. Niemi:
J. Vac. Sci. & Technol. B 13 (1995) 161[AIP Scitation].
- F. Keller, M. S. Hunter and D. L. Robinson: J. Electrochem. Soc. 100 (1953) 411.
- C. G. Granqvist, A. Andersson and O. Hunderi:
Appl. Phys. Lett. 35 (1979) 268[AIP Scitation].
- S. Kawai and R. Ueda: J. Electrochem. Soc. 121 (1975) 32.
- M. Shiraki, Y. Wakui, T. Tokushima and N. Tsuya: IEEE. Trans. Magn. MAG-21 (1985) 1465.
- M. Saito and M. Miyagi: Appl. Opt. 28 (1989) 3529.
- I. Mizuki, H. Masuda and N. Baba: Proc. Symp. 3rd IUMRS Int. Conf. Advanced Materials, Tokyo, 1994 (Elsevier, Amsterdam, 1994) Vol. 15A, p. 381.
- C. A. Huber, T. E. Huber, M. Sadoqi, J. A. Lubin, S. Manalis and C. B. Prater: Science 263 (1994) 800[Science].
- K. Itaya, S. Sugawara, K. Arai and S. Saito: J. Chem. Eng. Jpn. 17 (1984) 514.
- R. C. Furneaux, W. R. Rigby and A. P. Davidson:
Nature 337 (1989) 147[CrossRef].
- H. Masuda and K. Fukuda: Science 268 (1995) 1466[Science].
- M. Nagayama, H. Takahashi and M. Koda: J. Met. Surf. Finish. Soc. Jpn. 30 (1979) 438.
- C. A. Spindt, I. Brodie, L. Humphrey and E. R. Westerberg:
J. Appl. Phys. 47 (1976) 5248[AIP Scitation].
- H. Masuda, H. Tanaka and N. Baba: Chem. Lett. 1990 (1990) 621.
- H. Masuda, K. Nishio and N. Baba:
Thin Solid Films 223 (1993) 1[CrossRef].
- H. Masuda, T. Mizuno, N. Baba and T. Ohmori: J. Electroanal. Chem. 368 (1994) 333.