Jpn. J. Appl. Phys. 42 (2003) pp. 4856-4860  |Next Article|  |Table of Contents|
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Nano-Four-Point Probes on Microcantilever System Fabricated by Focused Ion Beam

Masao Nagase, Hiroshi Takahashi¹, Yoshiharu Shirakawabe¹ and Hideo Namatsu

(Received January 15, 2003; accepted for publication April 3, 2003)

We have developed a new cantilever system for scanning probe microscopy. The microcantilever system designed for electrical resistivity measurements of nanomaterials has 16 electrodes and dual cantilevers. One cantilever with four additional electrodes is for the resistivity measurement in the four-point-probe mode. The other lever is for surface observation. The contact forces of both the levers are controlled by a piezoresistor in the self-sensitive detection mode. The nano-four-point probes on the electrical measurement lever are fabricated by using a focused ion beam. The width of the probe electrode is approximately 200 nm. The distance between the probes is approximately 300 nm. The feasibility of electrical measurements is confirmed by measuring the contact characteristics using a graphite sample.

KEYWORDS: cantilever, four-point probes, focused ion beam, scanning probe microscopy, resistivity measurement,
nanotechnology
URL: http://jjap.ipap.jp/link?JJAP/42/4856/
DOI: 10.1143/JJAP.42.4856

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