Jpn. J. Appl. Phys. 44 (2005) pp. L342-L344 |Previous Article| |Next Article| |Table of Contents|
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Letter
Formation of Hexagonal GaN Pyramids by Photo Assisted Electroless Chemical Etching
Dejun Fu1,2,,
Young Shin Park1,
Gennady N. Panin1 and
Tae Won Kang1
1Quantum-Functional Semiconductor Research Center, Dongguk University, 100-715 Seoul, Korea
2Accelerator Laboratory, Department of Physics, Wuhan University, Wuhan 430072, China
(Received September 6, 2004; accepted December 22, 2004; published February 25, 2005)
Hexagonal GaN pyramids were formed by the photo enhanced chemical etching of GaN epilayers grown on sapphire by molecular-beam epitaxy. Defective areas of the epilayers were selectively etched in a mixed solution of KOH and K2S2O8 under ultraviolet illumination, producing submicron-size pyramids nonuniformly distributed on the substrate. The cathodoluminescence of the pyramids was redshifted compared with that of the sample before etching. Atomic force microscopy suggested the facets of the pyramids to be (1012) oriented. High-resolution X-ray diffraction showed that the width of the (105) plane of the etched sample is smaller than that of the unetched sample. A larger quantity of K2S2O8 added to the KOH solution led to a high etching rate and the etched sample exhibited a strong cathodoluminescence.
KEYWORDS:
GaN, pyramid, electroless chemical etching, chathodoluminescence
URL:
http://jjap.ipap.jp/link?JJAP/44/L342/
DOI: 10.1143/JJAP.44.L342
- B. L. Ward, O. H. Nam, J. D. Hartman, S. L. English, B. L. McCarson, R. Schlesser, Z. Sitar, R. F. Davis and R. J. Nemanich:
J. Appl. Phys. 84 (1998) 5238[AIP Scitation].
- H. X. Jiang, J. Y. Lin, K. C. Zeng and W. Yang:
Appl. Phys. Lett. 75 (1999) 763[AIP Scitation].
- K. Tachibana, T. Someya, S. Ishida and Y. Arakawa:
Appl. Phys. Lett. 76 (2000) 3212[AIP Scitation].
- T. Kozawa, T. Ohwaki, Y. Taga and N. Sawaki:
Appl. Phys. Lett. 75 (1999) 3330[AIP Scitation].
- Y. H. Cho, H. M. Kim, T. W. Kang, J. J. Song and W. Yang:
Appl. Phys. Lett. 80 (2002) 1141[AIP Scitation].
- K. C. Zeng, J. Y. Lin, H. X. Jiang and W. Yang:
Appl. Phys. Lett. 74 (1999) 1227[AIP Scitation].
- Q. K. Liu, A. Hoffmann, H. Siegle, A. Kaschner, C. Thomsen, J. Christen and F. Bertram:
Appl. Phys. Lett. 74 (1999) 3122[AIP Scitation].
- D. A. Stocker, E. F. Schubert and J. M. Redwing:
Appl. Phys. Lett. 73 (1998) 2654[AIP Scitation].
- T. Kozawa, T. Kachi, T. Ohwaki, Y. Taga, N. Koide and M. Koike: J. Electrochem. Soc. 143 (1996) L17.
- D. A. Stocker, I. D. Goepfert, E. F. Schubert, K. S. Boutros and J. M. Redwing: J. Electrochem. Soc. 147 (2000) 763.
- T. Fujii, Y. Gao, R. Sharma, E. L. Hu, S. P. Denbaars and S. Nakamura:
Appl. Phys. Lett. 84 (2004) 855[AIP Scitation].
- D. J. Fu, G. N. Panin and T. W. Kang: J. Kr. Phys. Soc. 42 (2003) S 611.
- J. A. Bardwell, I. G. Foulds, J. B. Webb, H. Tang, J. Fraser, S. Moisa and S. J. Rolfe: J. Electron. Mater. 28 (1999) L24.
- H. M. Ng, N. G. Weimann and A. Chowdhury:
J. Appl. Phys. 94 (2003) 650[AIP Scitation].