Jpn. J. Appl. Phys. 45 (2006) pp. 5951-5953 |Previous Article| |Next Article| |Table of Contents|
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Brief Communication
Extreme Ultraviolet Emission from Laser-Irradiated Low-Density Xe Targets
Nobuyoshi Ueda,
Mizuho Nagata,
Hiroaki Nishimura,
Shinsuke Fujioka,
Tatsuya Aota,
Yuzuri Yasuda,
Yuichi Inubushi,
Tsuyoshi Ando,
Takayoshi Norimatsu,
Mitsuo Nakai,
Keiji Nagai,
Katsunobu Nishihara,
Atsushi Sunahara1,
Noriaki Miyanaga,
Yasukazu Izawa and
Kunioki Mima
Institute of Laser Engineering, Osaka University, 2-6 Yamada-Oka, Suita, Osaka 565-0871, Japan
1Institute for Laser Technology, Osaka University, 2-6 Yamada-Oka, Suita, Osaka 565-0871, Japan
(Received February 7, 2006; accepted March 28, 2006; published online July 7, 2006)
The effect of the initial density of xenon (Xe) targets on extreme ultraviolet (EUV) emission has been investigated. With decreasing initial density, it was found that the spectral width around 11 nm becomes broad, and the intensity of 13.5 nm emission increases. The maximum conversion efficiency (CE) for solid Xe targets is approximately 0.6% at a 2×1011 W/cm2 of laser intensity, whereas that for the low-density targets is approximately 0.7% at a 4×1011 W/cm2. The spectral broadening with decreasing initial density can be attributed to the change in optical thickness of laser-produced plasmas. The enhancement of CE is attributed to optically thick plasma formation.
KEYWORDS:
EUV, laser plasma, xenon, low-density target
URL:
http://jjap.ipap.jp/link?JJAP/45/5951/
DOI: 10.1143/JJAP.45.5951
- R. C. Spitzer, T. J. Orzechowski, D. W. Phillion, R. L. Kauffman and C. Cerjan:
J. Appl. Phys. 79 (1996) 2251[AIP Scitation].
- I. C. E. Turcu and J. B. Dance: X-rays from Laser Plasma: Generations and Applications (John Wiley & Sons, Chichester, 1999) Chap. 10.
- H. Komori, T. Abe, T. Suganuma, Y. Imai, Y. Sugimoto, H. Someya, H. Hoshino, G. Soumagne, Y. Takabayashi, H. Mizoguchi, A. Endo, K. Toyoda and Y. Horiike:
J. Vac. Sci. Technol. B 21 (2003) 2843[AIP Scitation].
- A. Shimoura, T. Mochizuki, S. Miyamoto, S. Amano and T. Uyama:
Appl. Phys. Lett. 75 (1999) 2026[AIP Scitation].
- S. Miyamoto, A. Shimoura, S. Amano, K. Fukugaki, H. Kinugasa, T. Inoue and T. Mochizuki:
Appl. Phys. Lett. 86 (2005) 261502[AIP Scitation].
- N. Ueda, S. Fujioka, H. Nishimura, Y. Tao, T. Okuno, T. Ando, H. Kurayama, Y. Yasuda, K. Nishihara, A. Sunahara, N. Miyanaga and Y. Izawa: Annu. Prog. Report ILE, 2004, p. 224.
- T. Okuno, S. Fujioka, H. Nishimura, Y. Tao, K. Nagai, Q. Gu, N. Ueda, T. Ando, K. Nishihara, T. Norimatsu, N. Miyanaga, Y. Izawa and K. Mima:
Appl. Phys. Lett. 88 (2006) 161501[AIP Scitation].
- M. Nagata, T. Norimatsu, M. Nakai, K. Nagai, N. Ueda, S. Fujioka, T. Aota, H. Nishimura, K. Nishihara, N. Miyanaga, Y. Izawa and K. Mima: submitted to Jpn. J. Appl. Phys.
- F. Bijkerk, G. Hergenhan, G. Schriever, K. Gabel, M. Schuermann, R. de Bruijn, S. A. van der Westen, T. Missalla, U. Stamm and V. Bakshi: Tech. Rep. 04024498A-TR, International SEMATECH Manufacturing Initiative (2004). http://www.sematech.org/docubase/abstracts/4498atr.htm.
- N. Ueda, H. Nishimura, S. Fujioka, N. Miyanaga, J. Uegaki, K. Shimizu, T. Yamada and Y. Izawa:
Rev. Sci. Instrum. 76 (2005) 113109[AIP Scitation].
- H. Tanuma, H. Ohashi, E. Shibuya, N. Kobayashi, T. Okuno, S. Fujioka, H. Nishimura and K. Nishihara: Nucl. Instrum. Methods Phys. Res., Sect. B 235 (2005) 331.
- S. Fujioka, H. Nishimura, K. Nishihara, A. Sasaki, A. Sunahara, T. Okuno, N. Ueda, T. Ando, Y. Tao, Y. Shimada, K. Hashimoto, M. Yamaura, K. Shigemori, M. Nakai, K. Nagai, T. Norimatsu, T. Nishikawa, N. Miyanaga, Y. Izawa and K. Mima:
Phys. Rev. Lett. 95 (2005) 235004[APS].
