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Jpn. J. Appl. Phys. 45 (2006) pp. L197-L200  |Previous Article| |Next Article|  |Table of Contents|
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Letter

Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons

Atsuro Nakano, Takahiro Kozawa, Seiichi Tagawa, Tomasz Szreder1, James F. Wishart1, Toshiyuki Kai2 and Tsutomu Shimokawa2

The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
1Chemistry Department, Brookhaven National Laboratory, Upton, New York 11973-5000, U.S.A.
2JSR Corp., 100 Kawajiri-cho, Yokkaichi, Mie 510-8552, Japan

(Received November 22, 2005; accepted December 17, 2005; published online February 10, 2006)

In chemically amplified resists for ionizing radiations such as electron beams and extreme ultraviolet (EUV), low-energy electrons play an important role in the pattern formation processes. The reactivity of acid generators with low-energy electrons was evaluated using solvated electrons in tetrahydrofuran, which were generated by a pulsed electron beam. The rate constants of acid generators with the solvated electrons ranged from 0.6 to 1.9 ×1011 M-1 s-1.

KEYWORDS: acid generator, reactivity, chemically amplified resist, electron beam lithography, EUV lithography
URL: http://jjap.ipap.jp/link?JJAP/45/L197/
DOI: 10.1143/JJAP.45.L197


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