Jpn. J. Appl. Phys. 46 (2007) pp. 7852-7854  |Previous Article| |Next Article|  |Table of Contents|
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Brief Communication

Thin-Film Deposition of Metal Oxides by Aerosol-Assisted Chemical Vapour Deposition: Evaluation of Film Crystallinity

Masahiro Takeuchi and Kunisuke Maki

(Received January 11, 2007; accepted September 5, 2007; published online December 6, 2007)

Sn-doped In₂O₃ (ITO) thin films are deposited on glass substrates using 0.2 M aqueous and methanol solutions of InCl₃(4H₂O) with 5 mol % SnCl₂(2H₂O) by aerosol-assisted chemical vapour deposition under positive and negative temperature gradient conditions. The film crystallinity is evaluated by determining the film thickness dependence of X-ray diffraction peak height. When using aqueous solution, the ITO films grow with the same crystallinity during the deposition, but when using methanol solution, the preferred orientation of ITO changes during the deposition.

KEYWORDS: aerosol-assisted CVD, ITO, film crystallinity, aqueous and organic solutions
URL: http://jjap.ipap.jp/link?JJAP/46/7852/
DOI: 10.1143/JJAP.46.7852

References

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