Jpn. J. Appl. Phys. 46 (2007) pp. L392-L395 |Previous Article| |Next Article| |Table of Contents|
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Express Letter
Ion Beam Deposition Technique for Fabricating Luminescent Thin Films from a Solution of Nanocrystalline Semiconductor Dots
Satoshi Kobayashi,
Yuki Tani, and
Hiroshi Kawazoe1
R&D Center, HOYA Corporation, 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan
1Emeritus Professor, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8550, Japan
(Received March 27, 2007; accepted April 5, 2007; published online April 20, 2007)
We report a new technique for fabricating organic-free luminescent thin films from solution-synthesized surfactant-capped nanocrystalline semiconductor quantum dots with a core/shell structure. Colloidal solutions of CdSe/ZnS nanocrystals with diameters of 2.1 to 5.1 nm were made into ion beams and deposited on polycrystalline substrates under high vacuum; we applied the ion beam direct deposition technique with an electrospray ionizer, supersonic jet emitter, and energy analyzer. The nanocrystalline structure was preserved in the thin films; the photoluminescence spectra were identical to those of the source solution, although the thin films were essentially surfactant- and solvent-free.
KEYWORDS:
quantum dot, ion beam, deposition, electrospray, thin film, luminescence, cadmium selenide, zinc sulfide
URL:
http://jjap.ipap.jp/link?JJAP/46/L392/
DOI: 10.1143/JJAP.46.L392
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