Jpn. J. Appl. Phys. 47 (2008) pp. 1251-1255 |Previous Article| |Next Article| |Table of Contents|
|Full Text PDF: FREE (359K)|
Optical and Electrical Characterization of Poly(3-hexylthiophene-2,5-diyl) Interface with Al and LiF
Vipul Singh,
Anil K. Thakur,
Shyam S. Pandey,
Wataru Takashima, and
Keiichi Kaneto
Graduate School of Life Sciences and Systems Engineering, Kyushu Institute of Technology, 2-4 Hibikino, Wakamatsu-ku, Kitakyushu 808-0196, Japan
(Received April 12, 2007; accepted July 3, 2007; published online February 15, 2008)
The qualitative nature of the interface of poly(3-hexylthiophene-2,5-diyl) (P3HT) with aluminum (Al) and lithium fluoride (LiF) have been studied by photoluminescence (PL) spectra and photo induced memory techniques. The PL quenching and photo induced memory effect are clearly distinguishable in P3HT films coated with Al and LiF coated separately. It has been observed that LiF only forms an insulating barrier while aluminum creates a depletion layer with P3HT. The observed effects have been explained, based on carrier diffusion and band bending models.
KEYWORDS:
interface, photoluminescence, photo-induced memory, depletion layer, poly(3-hexylthiophene)
URL:
http://jjap.ipap.jp/link?JJAP/47/1251/
DOI: 10.1143/JJAP.47.1251
- P. Pneumans, A. Yakimov, and S. R. Forrest:
J. Appl. Phys. 93 (2003) 3693[AIP Scitation].
- H. E. Katz and Z. Bao:
J. Phys. Chem. B 104 (2000) 671[CrossRef].
- S. Fujimoto, K. Nakayama, and M. Yokoyama:
Appl. Phys. Lett. 87 (2005) 133503[AIP Scitation].
- L. Ma and Y. Yang:
Appl. Phys. Lett. 85 (2004) 5084[AIP Scitation].
- J. C. Scott:
J. Vac. Sci. Technol. A 21 (2003) 521[AIP Scitation].
- W. R. Siliveira and J. A. Marohn:
Phys. Rev. Lett. 93 (2003) 116104[APS].
- W. Osikowicz, M. P. de Jong, S. Braun, C. Tengstedt, M. Fahlman, and W. R. Salaneck:
Appl. Phys. Lett. 88 (2006) 193504[AIP Scitation].
- Y. D. Jin, X. B. Ding, J. Reynaert, V. I. Arkhipov, G. Borghs, P. L. Heremans, and M. Van der Auweraer: Org. Electron. 5 (2004) 271.
- T. Yokoyama, H. Ishii, and Y. Ouchi: Surf. Rev. Lett. 9 (2002) 425.
- M. A. Baldo and S. R. Forrest:
Phys. Rev. B 64 (2001) 085201[APS].
- C. J. Brabec, S. E. Shaheen, C. Winder, N. S. Sariciftci, and P. Denk:
Appl. Phys. Lett. 80 (2002) 1288[AIP Scitation].
- V. Singh, M. Yano, W. Takashima, and K. Kaneto:
Jpn. J. Appl. Phys. 45 (2006) 534[IPAP].
- T. W. Lee, J. Zaumseil, Z. Bao, J. W. P. Hsu, and J. A. Rogers: Proc. Natl. Acad. Sci. U.S.A. 101 (2004) 429.
- S. Natarajan and S. H. Kim: Chem. Commun. (2006) 729.
- H. Becker, S. E. Burns, and R. H. Friend:
Phys. Rev. B 56 (1997) 1893[APS].
- A. K. Thakur, A. K. Mukherjee, D. M. G. Preethichandra, W. Takashima, and K. Kaneto:
J. Appl. Phys. 101 (2007) 104508[AIP Scitation].
- K. Kaneto, S. S. Pandey, and W. Takashima:
Jpn. J. Appl. Phys. 40 (2001) 4933[IPAP].
- S. S. Pandey, W. Takashima, K. Rikitake, T. Endo, M. Rikukawa, and K. Kaneto:
Jpn. J. Appl. Phys. 40 (2001) 5350[IPAP].
- S. S. Pandey, S. Nagamatsu, W. Takashima, and K. Kaneto:
Jpn. J. Appl. Phys. 39 (2000) 6309[IPAP].
- M. Ujimoto, W. Takashima, and K. Kaneto:
Thin Solid Films 499 (2006) 313[CrossRef].
- K. Rikitake, D. Tanimura, W. Takashima, and K. Kaneto:
Synth. Met. 137 (2003) 1421[CrossRef].