Jpn. J. Appl. Phys. 47 (2008) pp. 2977-2981  |Previous Article| |Next Article|  |Table of Contents|
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Ion Beam Deposition of Quantum Dots from Colloidal Solution

Yuki Tani, Satoshi Kobayashi, and Hiroshi Kawazoe

(Received October 2, 2007; accepted December 14, 2007; published online April 25, 2008)

A newly developed ion beam deposition technique for fabrications of organic free quantum dot (QD) structured thin films from colloidal solutions of surfactant-capped nanocrystalline provides a uniform speed to electrosprayed QD ions independently of its form. A CdSe/ZnS QDs ion beam was generated from a colloidal solution source to deposit onto a substrate in a vacuum chamber. The energy spectra of the quantum dots ion beam were measured using an energy analyzer. We discuss appropriate conditions for a valid deposition onto a substrate in terms of ion energy. The ion energy provided from a free jet accelerator was set at 6 keV, or 0.25 eV/atom (Cd, Se). A cross-sectional transmission electron microscopy image of the deposited film shows that the deposited QDs are densely packed in a polycrystalline thin film configuration. Photoluminescence (PL) collected from the deposited film provides evidence that the deposited QDs are preserved. These suggest the soft landing of the QDs with appropriate surface passivations.

KEYWORDS: quantum dot, nano crystal, ion beam, deposition, electrospray, thin film, luminescence, cadmium selenide, zinc sulfide
URL: http://jjap.ipap.jp/link?JJAP/47/2977/
DOI: 10.1143/JJAP.47.2977

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