Jpn. J. Appl. Phys. 48 (2009) 126502 (5 pages)  |Previous Article| |Next Article|  |Table of Contents|
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Kinematical Modeling of Pad Profile Variation during Conditioning in Chemical Mechanical Polishing

Sangjik Lee, Sukhoon Jeong, Kihyun Park, Hyoungjae Kim¹, and Haedo Jeong²

(Received March 3, 2009; accepted September 7, 2009; published online December 21, 2009)

Conditioning is the process of removing the glazing area from a polishing pad surface and restoring the quality of the surface to maintain a stable polishing performance. However, the conditioning process can induce a non-uniform profile variation of the pad, which can result in nonuniform material removal rates across the wafer. In this paper, a kinematical model based on Preston's equation is proposed to examine the pad profile variation (PPV) induced by swing arm conditioning with a diamond disk. The proposed model was simulated with various swing arm velocity profiles (SAVPs), and the results were compared with experimental results. The results showed the relationship between kinematical parameters and the PPV. The PPV was proportional to sliding distance based on the kinematical model, and then the sliding distance distribution across the pad was dependent on the SAVP. This study has proven the effectiveness of the kinematical model on the PPV during conditioning in chemical mechanical polishing (CMP).

URL: http://jjap.ipap.jp/link?JJAP/48/126502/
DOI: 10.1143/JJAP.48.126502

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